1.

国際会議録
国際会議録
1. Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]
Lucas, K. ; Patterson, K. ; Boone, R. ; Miramond, C. ; Borjon, A. ; Belledent, J. ; Toublan, O. ; Entradas, J. ; Trouiller, Y.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. 65nm OPC and design optimization by using simple electrical transistor simulation
Trouiller, Y. ; Devoivre, T. ; Belledent, J. ; Foussadier, F. ; Borjon, A. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Chapon, J. -D. ; Arnaud, F. ; Entradas, J.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.378-388,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
3.

国際会議録
国際会議録
3. Improving model-based OPC performance for the 65-nm node through calibration set optimization
Patterson, K. ; Trouiller, Y. ; Lucas, K. ; Belledent, J. ; Borjon, A. ; Rody, Y. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.294-301,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
4.

国際会議録
国際会議録
4. Hydrothermal Oxidation of Organic Compounds by Nitrate and Nitrite
Dell'Orco, P. ; Foy, B. ; Wilmanns, E. ; Le, L. ; Ely, J. ; Patterson, K. ; Buelow, S.
出版情報: Innovations in supercritical fluids : science and technology : developed from a symposium held at the American Institute of Chemical Engineers Annual Meeting, San Francisco, California, November 13-18, 1994.  pp.179-,  1995.  Washington, DC.  American Chemical Society
シリーズ名: ACS symposium series
シリーズ巻号: 608
5.

国際会議録
国際会議録
5. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
6.

国際会議録
国際会議録
6. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
7.

国際会議録
国際会議録
7. Assessment of complementary double dipole lithography for 45 nm and 32 nm technologies
Postnikov, S. V. ; Robert, E. ; Thony, P. ; Patterson, K. ; Warrick, S. ; Henry, D. ; Torres, A. ; Toublon, O.
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1478-1484,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
8.

国際会議録
国際会議録
8. Closing the defect printability loop: optimizing defect specifications for an established lithographic process
Patterson, K. ; Wakefield, C. ; Sixt, P. ; Sundermann, F. ; Trouiller, Y. ; Belledent, J. ; Couderc, C. ; Rody, Y. ; Lucas, K.
出版情報: 24th Annual BACUS Symposium on Photomask Technology.  pp.1076-1082,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5567
9.

国際会議録
国際会議録
9. Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28]
Rody, Y. ; Martin, P. ; Couderc, C. ; Sixt, P. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Miramond-Collet, C. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Trouiller, Y.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
10.

国際会議録
国際会議録
10. Through-process window resist modelling strategies for the 65 nm node [5992-46]
Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.599219-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992