1.

国際会議録
国際会議録
1. Study on Etching Mechanism of Al2O3 as a Stopper Layer for Self-Aligned Contact in a High Density Plasma Tool
Park, W.J. ; Hong, J. ; Jeon, J.S. ; Min, G.J. ; Chi, K.K. ; Moon, J.T.
出版情報: Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology.  pp.428-435,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-17
2.

国際会議録
国際会議録
2. Spray Casting of Al-25Si Alloy and Hot Deformation Behavior
Park, W.J. ; Ha, T.K. ; Ahn, S.H. ; Chang, Y.W.
出版情報: Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003.  pp.609-612,  2004.  Zuerich.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 449-452