1.

国際会議録
国際会議録
1. EFFECTS OF HALOGEN-CONTAINING GAS PLASMA AND RAPID THERMAL ANNEAL TREATMENT ON THE REACTIVE ION ETCHED SILICON
Kwon, Kwang-Ho ; Kim, Bo-Woo ; Park, Hyung-Ho ; Kang, Jin-Yeong ; Yeom, Gun-Yung
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.481-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
2.

国際会議録
国際会議録
2. HETEROSTRUCTURAL CHARACTERIZATION OF PSEUDOMORPHIC, PARTIALLY STRAINED, AND HIGHLY MISMATCHED SEMICONDUCTORS USING DOUBLE CRYSTAL X-RAY DIFFRACTION, TEM AND SEM
Kim, Hyung Mun ; Kim, Sang-Gi ; Nahm, Sahn ; Park, Hyung-Ho ; Lee, Hae-Kwon ; Lee, Jae-Jin ; Cho, Kyung-Ik ; Choo, Heung Ro ; Kim, Hong Man ; Park, Hyung Moo ; Park, Sin-Chong
出版情報: Compound semiconductor epitaxy : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.343-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 340
3.

国際会議録
国際会議録
3. Surface Properties of GaAs Passivated with (NH4)2Sx Solution
Suh, Kyung-Soo ; Park, Hyung-Ho ; Lee, Jong-Lam ; Kim, Haechon ; Cho, Kyung-Ik ; Kim, Kyung-Soo
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.333-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386