1.

国際会議録
国際会議録
1. A New Poly-Si YFTs with Low Leakage Current*
Han, M.-K. ; Park, C.-M.
出版情報: Proceedings of the fourth Symposium on Thin Film Transistor Technologies.  pp.60-75,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-22
2.

国際会議録
国際会議録
2. Orientation Relationships and Variant Selection during α- to γ- Phase Transformation in Low Carbon Steel
Park, C.-M. ; Bruckner, G. ; Gottstein, G.
出版情報: Textures of materials : ICOTOM 13 : proceedings of the 13th International Conference on Textures of Materials, Seoul, Korea, August 26-30, 2002.  pp.1191-1196,  2002.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 408-412
3.

国際会議録
国際会議録
3. Evaluation of pointing techniques for ray casting selection in virtual environments
Lee, S. ; Seo, J. ; Kim, G.J. ; Park, C.-M.
出版情報: Third International conference on virtual reality and its application in industry : 9-12 April 2002, Hangzhou, China.  pp.38-44,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4756
4.

国際会議録
国際会議録
4. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process
Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.597-605,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
出版情報: Advances in Resist Technology and Processing XXI.  pp.1082-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
6.

国際会議録
国際会議録
6. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device
Kim, S.-W. ; Lee, S.-W. ; Park, C.-M. ; Choi, S.-H. ; Lee, Y.-M. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
出版情報: Optical Microlithography XVII.  pp.1157-1164,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377