1.

国際会議録
国際会議録
1. LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA
Sung, K. T. ; Pang, S. W.
出版情報: Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A..  pp.319-324,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 236
2.

国際会議録
国際会議録
2. *A COMPARISON BETWEEN DRY ETCHING WITH AN ELECTRON CYCLOTRON RESONANCE SOURCE AND REACTIVE ION ETCHING FOR GaAs AND InP
Pang, S. W.
出版情報: Advanced III-V compound semiconductor growth, processing and devices : symposium held Decmber[i.e. December] 2-5, 1991, Boston, Massachusetts, U.S.A..  pp.273-284,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 240
3.

国際会議録
国際会議録
3. EVALUATION OF DRY ETCHING INDUCED DAMAGE OF GaInAs USING TRANSMISSION LINES AND SCHOTTKY DIODES
Thomas, S., III ; Pang, S. W.
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.421-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
4.

国際会議録
国際会議録
4. PHOTOREFLECTANCE CHARACTERIZATION OF ETCH-INDUCED DAMAGE IN DRY ETCHED GaAs
Glembocki, O. J. ; Tuchman, J. A. ; Ko, K. K. ; Pang, S. W. ; Giordana, A. ; Stutz, C. E.
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.153-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
5.

国際会議録
国際会議録
5. In-Situ Fiberoptic Thermometry Measurements of Wafer Temperature During Plasma Etching Using an Electron Cyclotron Resonance Source
Thomas, S., III ; Berg, E. W. ; Pang, S. W.
出版情報: Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.75-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 406
6.

国際会議録
国際会議録
6. RELATING PHOTORESIST ETCH CHARACTERISTICS TO LANGMUIR PROBE MEASUREMENTS IN AN ELECTRON CYCLOTRON RESONANCE SOURCE
Sung, K. T. ; Juan, W. H. ; Pang, S. W. ; Dahimene, M.
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.305-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
7.

国際会議録
国際会議録
7. IN-SITU MONITORING BY MASS SPECTROMETRY FOR GaAs ETCHED WITH AN ELEFCTRON CYCLOTRON RESONANCE SOURCE
Kahaian, D. J. ; Pang, S. W.
出版情報: Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.329-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 324
8.

国際会議録
国際会議録
8. Electrical Characterization and Surface Analysis of Dry Etch Induced Damage on Si after Etching in an Electron Cyclotron Resonance Source
Sung, K. T. ; Pang, S. W. ; Cole, M.W. ; Pearce, N.
出版情報: Proceedings of the tenth symposium on plasma processing.  pp.132-143,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-20
9.

国際会議録
国際会議録
9. LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA
Sung, K. T. ; Pang, S. W.
出版情報: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.781-786,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 235
10.

国際会議録
国際会議録
10. Response Time for Optical Emission and Mass Spectrometric Signals During Etching of Heterostructures
Thomas, S., III ; Chen, H. H. ; Pang, S. W.
出版情報: Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.27-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 406