1.

国際会議録
国際会議録
1. NON-ALLOYED OHMIC CONTACTS TO n-GaAs USING EPITAXIAL Ge LAYERS
Sawada, T. ; Chen, W.X. ; Marshall, E.D. ; Kavanagh, K.L. ; Kuech, T.F. ; Pai, C.S. ; Lau, S.S.
出版情報: Thin films : interfaces and phenomena : symposium held December 2-6, 1985, Boston, Massachusetts, USA.  pp.409-414,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 54
2.

国際会議録
国際会議録
2. Evaluation of Fluorinated Si02 Films Deposited in HDP(ICP) Reactor for the Application of Low Dielectric Constant Inter Metal Dielectric in ULSI Circuits
Velaga, A.N. ; Pai, C.S. ; Martin, E.P. ; Vitkavage, S.C.
出版情報: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.1183-1190,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-25