Kessel, C. R. ; Boardman, L. D. ; Rhyner, S. J. ; Cobb, J. L. ; Henderson, C. C. ; Rao, V. ; Okoroanyanwu, U.
出版情報:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.214-220, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Tittnich, M ; Hartley, J ; Denbeaux, G ; Okoroanyanwu, U. ; Levinson, H ; Petrillo, K. ; Robinson, C. ; Gil, D. ; Corliss, D. ; Back, D ; Brandl, S ; Schwarz, C ; Goodwin, F. ; Wei, Y. ; Martinick, B. ; Housley, R. ; Benson, P. ; Cummings, K
出版情報:
Emerging Lithographic Technologies X. pp.615101-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering