1.

国際会議録
国際会議録
1. Development of simplified process for KrF excimer halftone mask with chrome-shielding method
Kobayashi,S. ; Oka,N. ; Watanabe,K. ; Ohmori,K. ; Inoue,M. ; Iguchi,K.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.288-296,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
2.

国際会議録
国際会議録
2. Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithograph
Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S. ; Mori,S. ; Yano,E. ; Hada,H. ; Ohmori,K. ; Komano,H.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.600-607,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
3.

国際会議録
国際会議録
3. Development of simplified process for KrF excimer halftone mask with chrome-shielding method: ？
Kobayashi,S. ; Watanabe,K. ; Ohmori,K.
出版情報: 20th Annual BACUS Symposium on Photomask Technology.  pp.801-809,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4186