1.

国際会議録
国際会議録
1. Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography
Ganesan, R. ; Choi, J.-H. ; Yun, H.-J. ; Kwon, Y.-G. ; Kim, K.-S. ; Oh, T.-H. ; Kim, J.-B.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.40-51,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Molecular resists with t-butyl cholate as a dendrimer core
Kim, J.-B. ; Oh, T.-H. ; Kwon, Y.-G.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.549-556,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690