1.

国際会議録
国際会議録
1. Using the surface charge profiler for in-tine monitoring of doping concentration in silicon epitaxial wafer manufacturing
Tower,J.P. ; Kamieniecki,E. ; Nguyen,M.C. ; Danel,A.
出版情報: In-Line Methods and Monitors for Process and Yield Improvement.  pp.174-181,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3884
2.

国際会議録
国際会議録
2. Manipulator control by calibration-free stereo vision
Vollmann,K. ; Nguyen,M.C.
出版情報: Intelligent Robots and Computer Vision XV: Algorithms, Techniques,Active Vision, and Materials Handling.  pp.218-226,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2904