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出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.83-90, 2005. Pennington, NJ. Electrochemical Society
Ikeda, T. ; Watanabe, K ; Yamaguchi, H ; Nishizawa, H. ; Tamba, N. ; Usami, M. ; Natsuaki, N.
出版情報:
Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications. pp.390-399, 1995. Pennington, NJ. Electrochemical Society
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