Quantum Confinement of Integrated Pulse Electrochemical Etching of Porous Silicon for Metal Semiconductor Metal Photodetector

Quantum Confinement of Integrated Pulse Electrochemical Etching of Porous Silicon for Metal Semiconductor Metal Photodetector

著者名:

掲載資料名:

Main Tendencies in Applied Materials Science : Selected, peer reviewed papers from the 28th Regional Conference on Solid State Science and Technology 2014 (RCSSST 2014), November 25-27, 2014, Cameron Highlands, Pahang, Malaysia

シリーズ名:

Materials science forum

シリーズ巻号:

846

発行年:

2016

開始ページ:

245

終了ページ:

255

総ページ数:

11

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9783038357520 [3038357529]

言語:

英語

請求記号:

M23650 [v.846]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054303
シリーズID:	PA00000012
会議名:	Regional Conference on Solid State Science and Technology (RCSSST 2014)
回次:	28th
会議開催地:	Cameron Highlands, Pahang, Malaysia
会議開催年:	2014.11.25-2014.11.27
論文注記:	28th Regional Conference on Solid State Science and Technology 2014 (RCSSST 2014), November 25-27, 2014, Cameron Highlands, Pahang, Malaysia

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