1.

国際会議録
国際会議録
1. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
2.

国際会議録
国際会議録
2. 31 Pathways for advanced transistors using hafnium-based oxides by Atomic Layer Deposition
Londergan, A.R. ; Ramanathan, S. ; Winkler, J. ; Seidel, T.E. ; Gntt, J. ; Brown, G. ; Murto, R.W.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.243-264,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-14
3.

国際会議録
国際会議録
3. * Sub-100 nm Gate Stack/Ultra Shallow Junction Integration Challenges
Huff, H.R. ; Brown, G.A. ; Larson, L.A. ; Murto, R.W.
出版情報: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.263-296,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-9
4.

国際会議録
国際会議録
4. Study of Vacancy and Impurity Complexes in Si Solid-Phase Epitaxial Crystallization with Positron Annihilation Spectroscopy
Lindfors, C.D. ; Jones, K.S. ; Law, M.E. ; Downey, D.F. ; Murto, R.W.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B10.1-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
5.

国際会議録
国際会議録
5. Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance
Bersuker, G. ; Sim, J.H. ; Young, C.D. ; Choi, R. ; Lee, B.H. ; Lysaght, P. ; Brown, G.A. ; Zeitzoff, P.M. ; Gardner, M. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.31-36,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
6.

国際会議録
国際会議録
6. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811