SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

著者名:

Verhaverbeke, S.

掲載資料名:

Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

259

発行年:

1992

開始ページ:

391

終了ページ:

398

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991545 [1558991549]

言語:

英語

請求記号:

M23500/259

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015743
シリーズID:	PA00000011
会議名:	Symposium on chemical surface preparation, passivation, and cleaning for semiconductor growth and processing
回次:	1992
会議開催地:	San Francisco, CA, USA
会議開催年:	1992.04.27-1992.04.29

類似資料:

1 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M. Electrochemical Society	7 国際会議録 NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES Heyns, M. M., Verhaverbeke, S., Meuris, M., Mertens, P. W., Schmidt, H., Kubota, M., Philipossian, A., Dillenbeck, K., … MRS - Materials Research Society
2 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M. MRS - Materials Research Society	8 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K. Electrochemical Society
3 国際会議録 THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES Verneire, B., Rotondaro, A.L.P., Mertens, P.W., Verhaverbeke, S., Heyns, M.M. Electrochemical Society	9 国際会議録 IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., … Electrochemical Society
4 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	10 国際会議録 18 Optimized HF Solutions in ULSI Technology Teerlinck, I., Mertens, P.W., Vos, R., Meuris, M., Heyns, M.M. Electrochemical Society
5 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A. Electrochemical Society	11 国際会議録 Modeling Soft Breakdown of Ultrathin Gate Oxide Layers Houssa, M., Mertens, P. W., Heyns, M. M. MRS - Materials Research Society
6 国際会議録 SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K. Electrochemical Society	12 国際会議録 Effect of Cl in Gate Oxidation Mertens, P. W., McGeary, M. J., Schaekers, M., Sprey, H., Vermeire, B., Depas, M., Meuris, M., Heyns, M. M. MRS - Materials Research Society

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