1.

国際会議録
国際会議録
1. High-Rate Deposition of Ta-C:H Using an Electron Cyclotron Wave Resonance Plasma Source
Morrison, N. A. ; Muhl, S. ; Rodil, S. E. ; Milne, W. I. ; Robertson, J. ; Weiler, M. ; Wang, P. Z. ; Hutchings, I. ; Stolojan, V. ; Brown, L. M.
出版情報: Covalently bonded disordered thin-film materials : symposium held December 2-4, 1997, Boston, Massachusetts, U.S.A..  pp.147-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 498
2.

国際会議録
国際会議録
2. Effects of the Plasma Conditions on the Bonding Type in Carbon Nitride Thin Films
Mendez, J. M. ; Muhl, S. ; Gaona-Couto, A. ; Jimenez-Sandoval, Sergio
出版情報: Thin films - structure and morphology : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A..  pp.687-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 441
3.

国際会議録
国際会議録
3. Optical properties of TiO2-x thin films studied by spectroscopic ellipsometry: substrate temperature effect
Camacho-Lopez, M. A. ; Sanchez-Perez, C. A. ; Esparza-Garcia, A. ; Ghibaudo, E. ; Rodil, S. ; Muhl, S. ; Escobar-Alarcon, L.
出版情報: RIAO/OPTILAS 2004: 5th Iberoamerican meeting on optics and 8th Latin American meeting on optics, lasers, and their applications: ICO regional meeting : 3-8 October 2004, Porlamar, Isla de Margarita, Venezuela.  pp.545-550,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5622
4.

国際会議録
国際会議録
4. CONTINUOUS AMORPHOUS SILICON DEPOSITIONS OVER LARGE AND VERY LARGE (> 1m2) AREAS
Madan, A. ; Muhl, S. ; von Roedern, B.
出版情報: Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A..  pp.587-592,  1988.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 118