1.

国際会議録
国際会議録
1. Annealing of low-temperature substitutional gold in silicon:ring-diffusion of substitutional gold in silicon
Morooka,M.
出版情報: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part3  pp.1789-1794,  1997.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 258-263
2.

国際会議録
国際会議録
2. Dopant Diffusion in Strained and Relaxed Si1-xGex
Paine,A.D.N. ; Morooka,M. ; Willoughby,A.F.W. ; Bonar,J.M. ; Phillips,P. ; Dowsett,M.G. ; Cooke,G.
出版情報: Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995.  pp.345-348,  1995.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 196-201
3.

国際会議録
国際会議録
3. Control of Size and Density of Stacking Fault in Silicon by Gold Diffusion
Morooka,M. ; Takahashi,M. ; Hashimoto,F.
出版情報: Proceedings of the 17th International Conference on Defects in Semiconductors : ICDS-17, Gmunden, Austria, July 18-23, 1993.  Pt.3  pp.1523-1528,  1994.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 143-147