1.

国際会議録
国際会議録
1. SiGe-on-Insulator and Ge-on-Insulator Substrates Fabricated by Ge-Condensation Technique for High-Mobility Channel CMOS Devices
Tezuka, Tsutomu ; Mizuno, Tomohisa ; Sugiyama, Naoharu ; Nakaharai, Shu ; Moriyama, Yoshihiko ; Usuda, Koji ; Numata, Toshinori ; Hirashita, Norio ; Maeda, Tatsuro ; Takagi, Shin-ichi ; Miyamura, Yoshiji ; Toyoda, Eiji
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.65-76,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
2.

国際会議録
国際会議録
2. Strain Relaxation of Strained-Si Layers on SiGe-on-Insulator (SGOI) Structures After Mesa Isolation
Usuda, Koji ; Mizuno, Tomohisa ; Tezuka, Tsutomu ; Sugiyama, Naoharu ; Moriyama, Yoshihiko ; Nakaharai, Shu ; Takagi, Shin-ichi
出版情報: Spatially resolved characterization of local phenomena in materials and nanostructures : symposium held December 2-5, 2002, Boston, Massachusetts, U.S.A..  pp.317-644,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 738