1.

国際会議録
国際会議録
1. Repair and printability study of binary chrome masks with OPC features for 0.18-ｦﾌm technology node
Stewart,D.K. ; Ferranti,D.C. ; Morgan,J.C. ; Lessing,J. ; Kuo,J. ; Chiu,C.S.G.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.635-642,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
2.

国際会議録
国際会議録
2. Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks
Casey,J.D.,Jr. ; Doyle,A.F. ; Stewart,D.K. ; Ferranti,D.C. ; Raphaelian,M.L. ; Morgan,J.C.
出版情報: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.487-497,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3236
3.

国際会議録
国際会議録
3. Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks
Raphaelian,M.L. ; Casey,J.d. ; Doyle,A.F. ; Ferranti,D.C. ; Morgan,J.C.
出版情報: Photomask and X-Ray Mask Technology V.  pp.589-600,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3412