1.

国際会議録
国際会議録
1. AN INVESTIGATION OF THE INFLUENCE OF PLASMA CHARACTERISTICS ON THE ELECTRONIC AND OPTICAL PROPERTIES OF DEVICE QUALITY a-Si:H GROWN BY ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION
Knox, R.D. ; Dalal, V.L. ; Moradi, B.
出版情報: Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.781-786,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 219
2.

国際会議録
国際会議録
2. Surface Photovoltage Characterization of Low Temperature Annealed LPCVD Silicon on Glass
Sen, S. ; Hoff, A.M. ; Moradi, B. ; Lagowski, J. ; Jastrzebski, L.
出版情報: Proceedings of the Second Symposium on Thin Film Transistor Technologies.  pp.269-278,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-35