1.

国際会議録
国際会議録
1. Using overlays to improve network security
Keromytis, A.D. ; Misra, V. ; Rubenstein, D.
出版情報: Scalability and traffic control in IP networks II : 31 July-1 August, 2002, Boston, [Massachusetts], USA.  pp.245-254,  2002.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4868
2.

国際会議録
国際会議録
2. Interfacial l?roperties of Si-Si3N4 Formed by Remote Plasma and Rapid Thermal Processing
Lazar, H. ; Misra, V. ; Wang, Z. ; Mulkarni, M. ; Li, W. ; Mahler, M. ; Houser, J.R.
出版情報: Advances in rapid thermal processing : proceedings of the symposium.  pp.95-102,  1999.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-10
3.

国際会議録
国際会議録
3. Electrical and Material Properties of Metal Silicate Dielectrics and Metal Gates for Advanced CMOS Devices
Misra, V. ; Kulkarni, M. ; Heuss, G. ; Zhong, H. ; Lazar, H.
出版情報: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.291-298,  2000.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-9
4.

国際会議録
国際会議録
4. INTEGRATED PREDEPOSITION CLEANING/PASSIVATION OF Si SURFACES FOR MOS DEVICES WITH Si02/Si INTERFACES
Hattangady, S. ; Misra, V. ; Yasuda, T. ; Xu, X.L. ; Hornung, B. ; Lucovsky, G. ; Wortman, J.J.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.288-295,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
5.

国際会議録
国際会議録
5. Device Fabrication and Evaluation of Alternative High-K Dielectrics and Gate Electrodes Using a Non-Self Aligned Gate process
Kim, I. ; Han, S.K. ; Kiether, W. ; Lee, S.J. ; Lee, C.H. ; Luan, H.F. ; Luo, Z. ; Rying, E. ; Wicaksana, Z.Wang D. ; Zhu, W. ; Hauser, J. ; Kiingon, A. ; Kwang, D.L. ; Ma, T.P. ; Maria, J.P. ; Misra, V. ; Osburn, C.M.
出版情報: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.211-220,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-9
6.

国際会議録
国際会議録
6. Integration Issues with High k Gate Stacks*
Osburn, C.M. ; Han, S.K. ; Kim, I. ; Campbell, S.A. ; Garfunkel, E. ; Gustafson, T. ; Hauser, J. ; King, T.-J. ; Liu, Q. ; Ranade, P. ; Kingon, A. ; Kwong, D.-L. ; Lee, S.J. ; Lee, C.H. ; Lee, J. ; Onishi, K. ; Kang, C.S. ; Choi, R. ; Cho, H. ; Nich, R. ; Lucovsky, G. ; Hong, J.G. ; Ma, T.P. ; Zhu, W. ; Luo, Z. ; Maria, J.P. ; Wicaksana, D. ; Misra, V. ; Lee, J.J. ; Suh, Y.S. ; Parksons, G. ; Niu, D. ; Stemmer, S.
出版情報: ULSI Process Integration : proceedings of the International Symposium.  pp.375-390,  2003.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-6
7.

国際会議録
国際会議録
7. CONTROL OF Si-SiO2 INTERFACE PROPERTIES IN MOS DEVICES PREPARED BY PLASMA-ASSISTED AND RAPID THERMAL PROCESSES
Lucovsky, G. ; Yasuda, T. ; Ma, Y. ; Hattangady, S. V. ; Xu, X-L. ; Misra, V. ; Hornung, B. ; Wortman, J. J.
出版情報: Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.81-,  1994.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 318
8.

国際会議録
国際会議録
8. GATE QUALITY OXIDES PREPARED BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION
Kuehn, R. T. ; Xu, X. ; Holcombe, D. J. ; Misra, V. ; Wortman, J. J. ; Hauser, J. R. ; Wang, Q. -F. ; Maher, D. M.
出版情報: Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.531-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 334
9.

国際会議録
国際会議録
9. Interfacial Properties of Si-Si3N4 Formed by Remote Plasma Enhanced Chemical Vapor Deposition
Misra, V. ; Lazar, H. ; Kulkarni, M. ; Wang, Z. ; Lucovsky, G. ; Hauser, J. R.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.89-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
10.

国際会議録
国際会議録
10. Formation of Stacked Gate Oxides by Rapid-Thermal Processing
Misra, V. ; Heinisch, H.H. ; Henson, W.K. ; Hornung, B.E. ; Wortman, J.J.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.282-294,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1