1.

国際会議録
国際会議録
1. Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods
Bodermann, B. ; Mirande, W. ; Kerwien, N. ; Tavrov, A. ; Totzeck, M. ; Tiziani, H.
出版情報: Advanced characterization techniques for optics, semiconductors, and nanotechnologies : 3-5 August 2003, San Diego, California, USA.  pp.320-330,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5188
2.

国際会議録
国際会議録
2. Development of a nanoscale linewidth standard for high-resolution optical microscopy [5965-71]
Huebner, U. ; Morgenroth, W. ; Boucher, R. ; Mirande, W. ; Buhr, E. ; Fries, Th. ; Schwarz, N. ; Kunath-Fandrei, G. ; Hild, R.
出版情報: Optical fabrication, testing and metrology II : 13-15 September 2005, Jena, Germany.  pp.59651W-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5965
3.

国際会議録
国際会議録
3. Results of a round robin measurement on a new CD mask standard
Gans, F. ; Liebe, R. ; Richter, J. ; Schatz, Th. ; Hauffe, B. ; Hillmann, F. ; Dobereiner, S. ; Bruck, H.-J. ; Scheuring, G. ; Brendel, B. ; Bettin, L. ; Roth, K.-D. ; Steinberg, W. ; Schluter, G. ; Speckbacher, P. ; Sedlmeier, W. ; Scherubl, T. ; HaBler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Bosse, H.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.122-133,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
4.

国際会議録
国際会議録
4. UV and DUV microscopy for dimensional metrology on micro- and nano-structures
Bodermann, B. ; Ehret, G. ; Mirande, W.
出版情報: Optical Metrology in Production Engineering.  pp.35-43,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5457
5.

国際会議録
国際会議録
5. Metrological characterization of new CD photomask standards
Mirande, W. ; Bodermann, B. ; Haβler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Bosse, H.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.146-154,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
6.

国際会議録
国際会議録
6. Investigation and evaluation of scatterometric CD metrology methods [5858-40]
Wurm, M. ; Bodermann, B. ; Mirande, W.
出版情報: Nano- and Micro-Metrology.  pp.585813-585813,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5858
7.

国際会議録
国際会議録
7. Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses
Haessler-Grohne, W. ; Hahm, K. ; Mirande, W. ; Bosse, H. ; Arnz, M.
出版情報: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.142-150,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4764
8.

国際会議録
国際会議録
8. New methods for CD measurements on photomasks using dark field optical microscopy
Bodermann, B. ; Michaelis, W. ; Diener, A. ; Mirande, W.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.54-61,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148
9.

国際会議録
国際会議録
9. Development and characterization of new CD mask standards: a status report
Schaetz, T. ; Hauffe, B. ; Doebereiner, S. ; Brueck, H.-J. ; Brendel, B. ; Bettin, L. ; Roeth, K.-D. ; Steinberg, W. ; Speckbacher, P. ; Sedlmeier, W. ; Engel, T. ; Haessler-Grohne, W. ; Mirande, W. ; Bosse, H.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-53,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148
10.

国際会議録
国際会議録
10. Calibration procedures and application of the PTB photomask CD standard [5992-159]
Haβler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Ehret, G. ; Bosse, H.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992