1.

国際会議録
国際会議録
1. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
2.

国際会議録
国際会議録
2. Modeling the Influence of Pad Bending on the Planarization Performance During CMP
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.45-50,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
3.

国際会議録
国際会議録
3. Characterization of Slurry System and Suppression of Oxide Erosion in Aluminum CMP (Chemical-Mechanical Planarization)
Devriendt, ft. ; Grilaert, J. ; Heylen, N. ; Holl, K. ; Meuris, M. ; Yang, J. ; Zhong, L.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.115-122,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
4.

国際会議録
国際会議録
4. Oxidation of Glassy and Nanocrystalline Zr70Pd30 Alloys
Jastrow, L. ; Meuris, M. ; Koster, U. ; Froumin, N. ; Eliezer, D.
出版情報: Metastable, mechanically alloyed and nanocrystalline materials : ISMANAM 2001 : proceedings of the International Symposium on Metastable, Mecanically Alloyed and Nanocrystalline Materials, University of Michigan, Ann Arbor, MI, USA, Jun 24-29, 2001.  pp.627-632,  2002.  Zurich-Uetikon, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 386-388
5.

国際会議録
国際会議録
5. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
6.

国際会議録
国際会議録
6. MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS
Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-185,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
7.

国際会議録
国際会議録
7. APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
Wolke, K. ; Riedel, T. ; Haug, R. ; De Gendt, S. ; Heyns, M.M. ; Meuris, M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.204-211,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
8.

国際会議録
国際会議録
8. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
9.

国際会議録
国際会議録
9. In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, H.F ; Teerlinck, I. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.316-328,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-30
10.

国際会議録
国際会議録
10. 18 Optimized HF Solutions in ULSI Technology
Teerlinck, I. ; Mertens, P.W. ; Vos, R. ; Meuris, M. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.250-263,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-21