Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography
- 著者名:
- Carcia,P.F. ( DuPont Co.Central Research )
- French,R.H.
- Sharp,K.G.
- Meth,J.S.
- Smith,B.W.
- 掲載資料名:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2884
- 発行年:
- 1996
- 開始ページ:
- 255
- 終了ページ:
- 263
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- 言語:
- 英語
- 請求記号:
- P63600/2884
- 資料種別:
- 国際会議録
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3
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Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
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