1.

国際会議録
国際会議録
1. Characterization of laser-induced EUV plasma sources
Kranzusch,S. ; Mann,K.R.
出版情報: Applications of X rays generated from lasers and other bright sources II : 30-31 July 2001, San Diego, USA.  pp.114-120,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4504
2.

国際会議録
国際会議録
2. CHARISMA: a new way for angular-resolved scattering measurements
Apel,O. ; Gorling,C. ; Leinhos,U. ; Mann,K.R. ; Schafer,B.
出版情報: Laser-induced damage in optical materials, 2000 : 32nd Annual Boulder Damage Symposium, proceedings, 16-18, October, 2000, Boulder, Colorado.  pp.569-578,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4347
3.

国際会議録
国際会議録
3. Characterizing the absorption and aging behavior of DUV optical material by high-resolution excimer laser calorimetry
Mann,K.R. ; Eva,E.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1055-1061,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
4.

国際会議録
国際会議録
4. Surface finish and optical quality of CaF2 for UV lithography applications
Duparre,A. ; Thielsch,R. ; Kaiser,N. ; Jakobs,S. ; Mann,K.R. ; Eva,E.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1048-1054,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
5.

国際会議録
国際会議録
5. Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation
Heber,J. ; Thielsch,R. ; Blaschke,H. ; Kaiser,N. ; Mann,K.R. ; Eva,E. ; Leinhos,U. ; Gortler,A.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1041-1047,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
6.

国際会議録
国際会議録
6. Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers
Mann,K.R. ; Apel,O. ; Eva,E.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1019-1029,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
7.

国際会議録
国際会議録
7. Scatter and absorption losses from DUV optics:a comparative study
Apel,O. ; Mann,K.R.
出版情報: Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado.  pp.460-469,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3902
8.

国際会議録
国際会議録
8. Nonlinear absorption phenomena in oxide coatings for 193 nm
Apel,O. ; Mann,K.R. ; Heber,J. ; Thielsch,R.
出版情報: Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado.  pp.235-241,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3902
9.

国際会議録
国際会議録
9. Properties of fluoride DUV excimer laser optics:influence of the number of dielectric layers
Arens,W. ; Ristau,D. ; Ullmann,J. ; Zaczek,C. ; Thielsch,R. ; Kaiser,N. ; Duparre,A. ; Apel,O. ; Mann,K.R. ; Lauth,H. ; Bernitzki,H. ; Ebert,J. ; Schippel,St. ; Heyer,H.
出版情報: Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado.  pp.250-259,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3902
10.

国際会議録
国際会議録
10. Long-term test and characterization of optical components at 193 nm and 157 nm
Vogler,K. ; Klaft,I. ; Schroder,T. ; Stamm,U. ; Mann,K.R. ; Apel,O. ; Gorling,C. ; Leinhos,U.
出版情報: Inorganic optical materials II : 1-3 August, 2000, San Diego, USA.  pp.255-260,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4102