1.

国際会議録
国際会議録
1. Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62]
Ma, J. ; Han, K. ; Lee, K. ; Korobko, Y. ; Silva, M. ; Chavez, J. ; Irvine, B. ; Henrichs, S. ; Chakravorty, K. ; Olshausen, R. ; Chandramouli, M. ; Mammen, B. ; Padmanaban, R.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921P-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
2.

国際会議録
国際会議録
2. Development of an automated multiple-target mask CD disposition system to enable new sampling strategy [6152-58]
Ma, J. ; Farnsworth, J. ; Bassist, L. ; Cui, Y. ; Mammen, B. ; Padmanaban, R. ; Nadamuni, V. ; Kamath, M. ; Buckmann, K. ; Neff, J. ; Freiberger, P.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152