1.

国際会議録
国際会議録
1. MICROSTRUCTURE, STRESS AND ELECTRICAL PROPERTIES OF THE HIGHLY STABLE W/p+-In0.53Ga0.47As OHMIC CONTACTS
Katz, A. ; Maher, D. ; Thomas, P.M. ; Weir, B.E. ; Dautremont-Smith, W.C. ; Kimerling, L.C.
出版情報: Beam-solid interactions : physical phenomena : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.479-484,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 157
2.

国際会議録
国際会議録
2. INFLUENCE OF SURFACE PRE-CLEANING ON ELECTRICAL PROPERTIES OF RAPID THERMAL OXIDE AND RAPID THERMAL CHEMICAL VAPOR DEPOSITION OXIDE
Xu, Xiaoli ; Kuehn, R.T. ; Melzak, J.M. ; Hames, G.A. ; Wortman, J.J. ; Ozturk, M.C. ; Nemanich, R.J. ; Harris, G. ; Maher, D.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.81-86,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
3.

国際会議録
国際会議録
3. ELECTRICAL AND STRUCTURAL CHARACTERIXATION OF POLYSILICON DEPOSITED IN A RAPID THERMAL PROCESSOR
Xen, R. ; OztOrk, k, M. C. ; Wortman, J. J. ; Batchelor, D. ; Maher, D. ; Blat, C. ; Niccolian, E.
出版情報: Polysilicon thin films and interfaces.  pp.29-34,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 182
4.

国際会議録
国際会議録
4. Process Definition for Obtaining Ultrathin Silicon Oxides Using Full-Wafer Electrical and Optical Measurements
Oberhofer, A. ; Chen, J. ; Koh, K. ; Schrader, M. ; Shah, S. ; Venables, R. ; Young, C. ; Xu, M. ; Kuehn, R. ; Maher, D. ; Venables, D.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.573-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567