1.

国際会議録
国際会議録
1. FORMATION OF WELL-SEPARATED BURIED AND SURFACE NICKEL-SILICIDE LAYERS IN A SINGLE ION IMPLANTATION STEP
Wu, M.F. ; De Wachter, J. ; Hendrickx, P. ; Pattyn, H. ; Van Bavel, A.M. ; Langouche, G. ; Vanhellemont, J. ; Bender, H. ; Maenhoudt, M. ; Bruynseraede, Y.
出版情報: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.899-904,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 279
2.

国際会議録
国際会議録
2. Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ-193nm
Maenhoudt, M. ; Versluijs, J. ; Struyf, H. ; Olmen, J. Van ; Hove, M. Van
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1508-1518,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
3.

国際会議録
国際会議録
3. Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
出版情報: Optical Microlithography XIX.  pp.615409-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
4.

国際会議録
国際会議録
4. The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
Holsteyns, F. ; Cheung, L. ; Van Den Heuvel, D. ; Marcuccilli, G ; Simposon, G. ; Brun, R. ; Steinbach, A.. ; Fyen, W. ; Vangoidsenhoven, D. ; Merten, P. ; Maenhoudt, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
5.

国際会議録
国際会議録
5. Resist reflow for 193-nm low-K1 lithography contacts
Montgomery, P.K. ; Lucas, K. ; Strozewski, K.J. ; Zavyalova, L. ; Grozev, G. ; Reybrouck, M. ; Tzviatkov, P. ; Maenhoudt, M.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.807-816,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039