1.

国際会議録
国際会議録
1. Chemical Mechanical Polishing of Epitaxial Germanium on SiO2-patterned Si(001) Substrates
J.M. Hydrick ; J. Park ; J. Bai ; C. Major ; M. Curtin
出版情報: SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices.  pp.237-248,  2008.  Pennington, NJ.  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 16(10)
2.

国際会議録
国際会議録
2. Defect Reduction and Its Mechanism of Selective Ge Epitaxy in Trenches on Si(001) Substrates Using Aspect Ratio Trapping
J.-S. Park ; J. Bai ; M. Curtin ; B. Adekore ; Z. Cheng ; M. Carroll ; M. Dudley ; A. Lochtefeld
出版情報: Semiconductor defect engineering--materials, synthetic structures and devices II : symposium held April 9-13, 2007, San Francisco, California, U.S.A..  pp.315-320,  2007.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 994
3.

国際会議録
国際会議録
3. An integrated microsystem for multiplex processing of encoded silicon microbeads
D. Hoffmann ; M. Curtin ; M. Loughran
出版情報: Microfluidics, bioMEMS, and medical microsystems V : 22-24 January 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6465