1.

国際会議録
国際会議録
1. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
2.

国際会議録
国際会議録
2. 24 Effect of Thin Metal Layers on the Work Function of Polysilicon-Metal Electrode Stacks
Alshareef, H. ; Wen, H.-C. ; Choi, K. ; Harris, R. ; Lysaght, P. ; Luan, H. ; Majhi, P. ; Lee, B.H.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.198-206,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
3.

国際会議録
国際会議録
3. 17 Properties of the Interfacial Layer in the High-k Gate Stack and Transistor Performance
Bersuker, G. ; Peterson, J. ; Burnett, J. ; Korkin, A. ; Sim, J.H. ; Choi, R. ; Lee, B. H. ; Greer, J. ; Lysaght, P. ; Huff, H.R.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.141-145,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
4.

国際会議録
国際会議録
4. 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.282-292,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
5.

国際会議録
国際会議録
5. Process and Manufacturing Challenges for High-K Gate Stack Systems
Gilmer, M. C. ; Luo, T-Y. ; Huff, H. R. ; Jackson, M. D. ; Kim, S. ; Bersuker, G. ; Zeitzoff, P. ; Vishnubhotla, L. ; Brown, G. A. ; Amos, R. ; Brady, D. ; Watt, V. H. C. ; Gale, G. ; Guan, J. ; Nguyen, B. ; Williamson, G. ; Lysaght, P. ; Torres, K. ; Geyling, F. ; Gondran, C. F. H.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.323-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
6.

国際会議録
国際会議録
6. Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance
Bersuker, G. ; Sim, J.H. ; Young, C.D. ; Choi, R. ; Lee, B.H. ; Lysaght, P. ; Brown, G.A. ; Zeitzoff, P.M. ; Gardner, M. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.31-36,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
7.

国際会議録
国際会議録
7. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
8.

国際会議録
国際会議録
8. IMPACT OF ORGANIC CONTAMINATION ON DEVICE PERFORMANCE
Riley, D. ; Guan, I. ; Gale, G. ; Bersuker, G. ; Bennett, J. ; Lysaght, P. ; Nguyen, B.
出版情報: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.39-46,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-26