1.

国際会議録
国際会議録
1. OAI and PSM used in 193-nm lithography
Yao,H. ; Luo,X. ; Chen,X. ; Feng,B.
出版情報: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.253-260,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3741
2.

国際会議録
国際会議録
2. Method to devise multiphase complex mask in submicron lithography
Luo,X. ; Yao,H.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.987-994,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
3.

国際会議録
国際会議録
3. New method for improving the practical resolution of complex patterns in sub-half-micron lithography
Chen,X. ; Luo,X. ; Yao,H. ; Xiao,Q. ; Yu,G.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.567-578,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
4.

国際会議録
国際会議録
4. New mask having functions of OAI and PSM to realize sub-0.2-ｦﾌm patterns with 248 nm in microlithography
Luo,X. ; Yao,H. ; Chen,X. ; Feng,B.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.745-749,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
5.

国際会議録
国際会議録
5. Calibrated equipment for return loss of fiber optic passive components
Wang,L. ; Wu,Y. ; Luo,X.
出版情報: Instruments for optics and optoelectronic inspection and control, 8-10 November 2000, Beijing, China.  pp.69-72,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4223
6.

国際会議録
国際会議録
6. Analyzing LED-induced haemal fluorescent spectra on laboratory small albino rat
Gao,S. ; Luo,X. ; Lan,X. ; Jiao,F. ; Lu,J. ; Ni,X. ; Xu,J. ; Lu,S. ; Shen,J. ; Liu,J.
出版情報: International Workshop on Photonics and Imaging in Biology and Medicine : 8-10 October 2001, Wuhan, China.  pp.119-122,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4536
7.

国際会議録
国際会議録
7. Analysis of scattering from fractally rough surfaces by using the T-matrix method
Wang,X. ; Luo,X. ; Zhang,Z. ; Fu,J.
出版情報: Microwave remote sensing of the atmosphere and environment : 15-17 September 1998, Beijing, China.  pp.265-275,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3503
8.

国際会議録
国際会議録
8. Measurement of backscattering from sea with an airborne radar at L band
Luo,X. ; Zhang,Z. ; Yin,Z. ; Sun,F. ; Kang,S. ; Wang,L. ; Yu,Y. ; Wen,F.
出版情報: Microwave remote sensing of the atmosphere and environment : 15-17 September 1998, Beijing, China.  pp.218-225,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3503
9.

国際会議録
国際会議録
9. Mini-optically pumped NH3 cavity laser wideband emission at 67.2 ｦﾌm
Luo,X. ; Li,C.
出版情報: Millimeter and submillimeter waves III : proceedings of the International Conference on Millimeter and Submillimeter Waves and Applications III, 5-7 August 1996, Denver, Colorado.  pp.150-156,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2842
10.

国際会議録
国際会議録
10. Optimized operation of optically pumped NH3 laser emission at 12.08 ｦﾌm and 12.81 ｦﾌm
Luo,X. ; Qiu,R.
出版情報: Millimeter and submillimeter waves III : proceedings of the International Conference on Millimeter and Submillimeter Waves and Applications III, 5-7 August 1996, Denver, Colorado.  pp.143-149,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2842