1.

国際会議録
国際会議録
1. HIGH QUALITY Si AND Si1-XGeX FILMS AND HETEROJUNCTION BIPOL;AR TRANSISTORS GROWN BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION (RTCVD)
Green, M. L. ; Brasen, D. ; Temkin, H. ; Kannan, V. C. ; Luftman, H. S.
出版情報: Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A..  pp.55-64,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 146
2.

国際会議録
国際会議録
2. Comparative Study of Experimental Techniques for Boron Profiling at Poly-Si/SiO2 Interface
Furtsch, M. ; Bevk, J. ; Bude, J. ; Downey, S. W. ; Krisch, K. S. ; Moriya, N. ; Silverman, P. J. ; Luftman, H. S.
出版情報: Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A..  pp.857-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 378
3.

国際会議録
国際会議録
3. MEASURING VACANCY DIFFUSIVITY AND VACANCY ASSISTED CLUSTERING BY NITRIDATION ENHANCED DIFFUSION OF Sb IN Si(100) DOPING SUPERLATTICES
Mogi, Toshiharu K. ; Gossmann, H.-J. ; Rafferty, C. S. ; Luftman, H. S. ; Unterwald, F. C. ; Boone, T. ; Thompson, Michael O. ; Poate, J. M.
出版情報: Evolution of thin film and surface structure and morphology : symposium held November 28-December 2, 1994, Boston, Massachusetts, USA.  pp.157-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 355
4.

国際会議録
国際会議録
4. UNDERSTANDING AND CONTROLLING TRANSIENT ENHANCED DOPANT DIFFUSION IN SILICON
Stolk, P. A. ; Gossmann, H.-J. ; Eaglesham, D. J. ; Jacobson, D. C. ; Luftman, H. S. ; Poate, J. M.
出版情報: Beam-solid interactions for materials synthesis and characterization : symposium held November 28-December 2, 1994, Boston, Massachusetts, U.S.A..  pp.307-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 354
5.

国際会議録
国際会議録
5. RTA Processing of W-Polycide Dual-Gate Sub-Micron Structures for Low-Voltage CMOS Technology
Bevk, J. ; Furtsch, M. ; Georgiou, G. E. ; Hillenius, S. J. ; Schielein, D. ; Schiml, T. ; Silverman, P. J. ; Luftman, H. S.
出版情報: Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.115-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 429
6.

国際会議録
国際会議録
6. Measurement of Lateral Dopant Diffusion in Rapid Thermal Annealed W-Polycide Gate Structures
Schiml, T. ; Bevk, J. ; Furtsch, M. ; Georgiou, G. E. ; Cirelli, R. ; Mansfield, W. M. ; Silverman, P. J. ; Luftman, H. S.
出版情報: Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.121-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 429