1.

国際会議録
国際会議録
1. Linewidth measurement intercomparison on a BESOI sample
Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek,M.T. ; Allen,R.A. ; Cresswell,M.W. ; Ghoshtagore,R.N.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.84-95,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Edge determination for polycrystalline silicon lines on gate oxide
Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek Jr.,M.T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.147-156,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
3.

国際会議録
国際会議録
3. High-accuracy critical-dimension metrology using a scanning electron microscope
Lowney,J.R. ; Vladar,A.E. ; Postek,M.T.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.515-526,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725