1.

国際会議録
国際会議録
1. Safe Precursor Gas for Broad Replacement of SiH4 in Plasma Processes Employed in Integrated Circuit Production
Loboda, M. J. ; Seifferly, J. A. ; Grove, C. M. ; Schneider, R. F.
出版情報: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.145-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 447
2.

国際会議録
国際会議録
2. Crack-Free, Single-Crystal GaN Grown on 100 mm Diameter Silicon
Liaw, H. M. ; Venugopal, R. ; Wan, J. ; Doyle, R. ; Fejes, P. ; Loboda, M. J. ; Melloch, M. R.
出版情報: Silicon carbide and related materials - 1999 : ICSCRM'99, proceedings of the International Conference on Silicon Carbide and Related Materials - 1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999.  pp.1463-1466,  2000.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 338-342(2)
3.

国際会議録
国際会議録
3. Growth and Characterization of N-Doped SiC Films from Trimethylsilane
Chen, J. ; Steckl, A. J. ; Loboda, M. J.
出版情報: Silicon carbide and related materials - 1999 : ICSCRM'99, proceedings of the International Conference on Silicon Carbide and Related Materials - 1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999.  pp.273-276,  2000.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 338-342(1)
4.

国際会議録
国際会議録
4. PLASMA ETCHING AND SURFACE ANALYSIS OF a-SiC:H FILMS DEPOSITED BY LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
Thomas, J. H., III ; Loboda, M. J. ; Seifferly, J. A.
出版情報: Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.445-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 334