1.

国際会議録
国際会議録
1. COMPARISON OF THE DENSITY AND DISTRIBUTION OF TRAPS GENERATED BY HIGH VOLTAGE STRESS IN SILICON OXIDE AND SILICON OXYNITRIDES
Richardson, J.T. ; Dumin, D.J. ; Lo, G.Q. ; Kwong, D.L. ; Gross, B.J. ; Sodini, C.G.
出版情報: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.357-362,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 284
2.

国際会議録
国際会議録
2. N2O-Based Gate Dielectrics for ULSI Applications
Kim, J. ; Yoon, G.W. ; Lo, G.Q. ; Ahn, J. ; Kwong, D.L.
出版情報: Proceedings of the Symposium on the Degradation of Electronic Devices due to Device Operation as well as Crystalline and Process-Induced Defects.  pp.25-35,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-1