1.

国際会議録
国際会議録
1. Full-chip lithography manufacturability check for yield improvement [6156-33]
Huang, Y. ; Tseng, E. ; Lin, B. S.-M ; Yu, C. C. ; Wang, C.-W. ; Liu, H.-Y.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. NONDESTRUCTIVE COMPOSITIONAL AND DEFECT CHARACTERIZATION OF CdZnTe ALLOYS USING PHOTOLUMINESCENCE SPECTROSCOPY
Duncan, W.M. ; Koestner, R.J. ; Tregilgas, J.H. ; Liu, H.-Y. ; Chen, M.-C.
出版情報: Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A..  pp.39-44,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 161
3.

国際会議録
国際会議録
3. DEPTH SENSITIVE IMAGING OF DEFECS IN EPILAYERS AND SINGLE CRYSTALS USING WHITE BEAM SYNCHROTRON RADIATION TOPOGRAPHY IN GRAZING BRAGG-LAUE GEOMETRY
Dudley, M. ; Yao, G.-D. ; Wu, J. ; Liu, H.-Y.
出版情報: Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.1031-1036,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 163
4.

国際会議録
国際会議録
4. Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
Cho, H.L. ; Lin, S.Y. ; Hsieh, F. ; Kroyan, A. ; Liu, H.-Y. ; Huang, J.H. ; Hsu, S.-H. ; Huang, I-H. ; Lin, B.S.-M. ; Hung, K.-C.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.778-786,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
5.

国際会議録
国際会議録
5. Extending ArF to the 65-nm node with full-phase lithography
Driessen, F.A. ; Pierrat, C. ; Vandenberghe, G. ; Ronse, K.G. ; Adrichem, P. ; Liu, H.-Y.
出版情報: Optical Microlithography XVI.  Part Two  pp.1091-1102,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
6.

国際会議録
国際会議録
6. Effects of alternating aperture PSM design on image imbalance for 65-nm technology
Kroyan, A. ; Liu, H.-Y.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1217-1226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
7.

国際会議録
国際会議録
7. Growth and characterization of multiple layer quantum dot lasers (Invited Paper)
Smowton, P.M. ; Walker, C.L. ; Sandall, l.C. ; Sellers, l.R. ; Mowbray, D.J. ; Liu, H.-Y. ; Gutierrez, M. ; Hopkinson, M.
出版情報: Novel In-Plane Semiconductor Lasers IV.  pp.332-346,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5738
8.

国際会議録
国際会議録
8. Limits of strong phase-shift patterning for device research
Fritze, M. ; Mallen, R.D. ; Wheeler, B. ; Yost, D. ; Snyder, J.P. ; Kasprowicz, B.S. ; Eynon, B.G. ; Liu, H.-Y.
出版情報: Optical Microlithography XVI.  Part One  pp.327-343,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
9.

国際会議録
国際会議録
9. Image-blur tolerances for 65-nm and 45-nm node IC manufacturing
Lalovic, I. ; Kroyan, A. ; Kye, J. ; Liu, H.-Y. ; Levinson, H.J.
出版情報: Optical Microlithography XVI.  Part Three  pp.1570-1580,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
10.

国際会議録
国際会議録
10. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
出版情報: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691