1.

国際会議録
国際会議録
1. Comparison of properties of electrical test structures patterned in BESOI and SIMOX films for CD reference-material applications
Allen,R.A. ; Ghoshtagore,R.N. ; Cresswell,M.W. ; Linholm,L.W. ; Sniegowski,J.J.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.124-131,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Noncontact electrical critical dimensions metrology sensor for chrome photomasks
Guillaume,N. ; Lahti,M. ; Cresswell,M.W. ; Allen,R.A. ; Linholm,L.W. ; Zaghloul,M.E.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.822-829,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562
3.

国際会議録
国際会議録
3. Electrical test structures replicated in silicon-on-insulator material
Cresswell,M.W. ; Sniegowski,J.J. ; Ghoshtagore,R.N. ; Allen,R.A. ; Linholm,L.W. ; Villarrubia,J.S.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.659-676,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725