1.

国際会議録
国際会議録
1. Defect printability for sub-0.18ｦﾌm design rules using 193-nm lithography process and binary OPC reticle
Phan,K.A. ; Spence,C.A. ; Schefske,J.A. ; Okoroanyanwu,U. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.773-780,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Process-induced defects in sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Pike,C. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.277-283,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
3.

国際会議録
国際会議録
3. Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Romero,J. ; Singh,B. ; Lee,S.-J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.781-790,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
4.

国際会議録
国際会議録
4. Integration considerations for 130-nm device patterning using ArF lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Yang,C.-Y. ; Pangrle,S.K. ; Schefske,J.A. ; Kent,E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.423-434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
5.

国際会議録
国際会議録
5. Issues and nonissues on a 193-nm step-and-scan system in production
Schefske,J.A. ; Kent,E. ; Okoroanyanwu,U. ; Levinson,H.J. ; Masud,C.R. ; Streefkerk,B. ; Hanzen,R. ; Brueback,J.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.460-471,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
6.

国際会議録
国際会議録
6. Lithography: a look at what is ahead
Levinson,H.J.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA.  pp.1-15,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4099
7.

国際会議録
国際会議録
7. Manufacturability of the ultrathin resist process
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
8.

国際会議録
国際会議録
8. Another look at stepper lens reduction and field size
Levinson,H.J. ; Ackmann,P.W. ; Peter,L. ; Arnaud,J.
出版情報: Photomask and Next-Generation Lithography Mask Technology VII.  pp.66-72,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4066
9.

国際会議録
国際会議録
9. Electrical linewidth measurement for next-generation lithography
Kye,J. ; Levinson,H.J.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.637-643,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
10.

国際会議録
国際会議録
10. Linewidth asymmetry study to predict aberration in lithographic lenses
Kye,J. ; Dusa,M.V. ; Levinson,H.J.
出版情報: Optical Microlithography XIV.  4346  pp.1280-1289,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346