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Characterization and reduction of copper chemical-mechanical-polishing-induced scratches

著者名:
Teo, T.Y. ( Nanyang Technological Univ. (Singapore) )
Goh, W.L. ( Nanyang Technological Univ. (Singapore) )
Leong, L.S. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Lim, V.S.K. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Tse, T.Y. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Chan, L. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
さらに 1 件
掲載資料名:
Process and Materials Characterization and Diagnostics in IC Manufacturing
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5041
発行年:
2003
開始ページ:
61
終了ページ:
69
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448460 [081944846X]
言語:
英語
請求記号:
P63600/5041
資料種別:
国際会議録

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