Inverse lithography technology at chip scale [6154-41]
- 著者名:
Lin, B. ( United Microelectronic Corp. (Taiwan) ) Shieh, M. F. ( United Microelectronic Corp. (Taiwan) ) Sun, J. ( United Microelectronic Corp. (Taiwan) ) Ho, J. ( Xilinx Inc. (USA) ) Wang, Y. ( Xilinx Inc. (USA) ) Wu, X. ( Xilinx Inc. (USA) ) Leitermann, W. ( Xilinx Inc. (USA) ) Lin, O. ( Toppan Chunghwa Electronics (Taiwan) ) Lin, J. ( Toppan Chunghwa Electronics (Taiwan) ) Liu, Y. ( Luminescent Technologies, Inc. (USA) ) Pang, L. ( Luminescent Technologies, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 615414
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
FPGA chip performance improvement with gate shrink through alternating PSM 9Onm process [5992-182]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |