1.

国際会議録
国際会議録
1. New UV-capable photomask CD metrology tool
Schlueter, G. ; Brueck, H. -J. ; Birkenmayer, S. ; Falk, G. ; Scheuring, G. ; Walden, L. ; Lehnigk, S.
出版情報: Photomask and X-Ray Mask Technology VI.  pp.592-598,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3748
2.

国際会議録
国際会議録
2. Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Scheuring, G. ; Petrashenko, A. ; Doebereiner, S. ; Hillmann, F. ; Brucek, H.-J. ; Hourd, A.C. ; Grimshaw, A. ; Hughes, G. ; Chen, S.-B. ; Chen, P.W. ; Schaetz, T. ; Struck, T. ; Van Adrichem, P.J.M. ; Boerland, H. ; Lehnigk, S.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.138-147,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148