1.

国際会議録
国際会議録
1. Initial results from the EUV engineering test stand
Tichenor,D.A. ; Ray-Chaudhuri,A.K. ; Lee,S.H. ; Chapman,H.N. ; Replogle,W.C. ; Berger,K.W. ; Stulen,R.H. ; Kubiak,G.D. ; Klebanoff,L.E. ; Wronosky,J.B. ; O'Connell,D.J. ; Leung,A.H. ; Jefferson,K.L. ; Ballard,W.P. ; Hale,L.C. ; Blaedel,K.L. ; Taylor,J.S. ; Folta,J.A. ; Spiller,E.A. ; Soufli,R.
出版情報: Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA.  pp.9-18,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4506
2.

国際会議録
国際会議録
2. Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme-ultraviolet wavelengths
Shumway,M.D. ; Lee,S.H. ; Cho,C.H. ; Naulleau,P. ; Goldberg,K.A. ; Bokor,J.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.357-362,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
3.

国際会議録
国際会議録
3. Recent advances in EUV phase-shifting point diffraction interferometry
Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C.C. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.
出版情報: EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado.  pp.154-163,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3767
4.

国際会議録
国際会議録
4. One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive(HEBS)gray-level mask
Daschner,W. ; Stein,R.D. ; Long,P. ; Wu,C. ; Lee,S.H.
出版情報: Diffractive and holographic optics technology III : 1-2 February, 1996, San Jose, California.  pp.153-155,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2689
5.

国際会議録
国際会議録
5. Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.
出版情報: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.114-123,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3331
6.

国際会議録
国際会議録
6. Structural optimization of InGaAsP/InP MQW electroabsorption waveguide modulator
Kim,D.-G. ; Lim,Y.-S. ; Choi,Y.-W. ; Lee,S.H. ; Kim,S. ; Cho,Y.S. ; Yi,J.C.
出版情報: Physics and simulation of optoelectronic devices VII : 25-29 January 1999, San Jose, USA.  pp.189-197,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3625
7.

国際会議録
国際会議録
7. Self-powered electrochromic coatings
Pichot,F. ; Gao,W. ; Gregg,B.A. ; Ferrere,S. ; Lee,S.H. ; Bullock,I.N. ; Xu,Y. ; Pitts,R.J. ; Tracy,C. ; Morrison,S.K. ; Deb,S.K. ; Benson,D.K. ; Branz,H.M.
出版情報: Switchable materials and flat panel displays : 21-22 July 1999, Denver, Colorado.  pp.59-68,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3788
8.

国際会議録
国際会議録
8. EUV holographic aerial image recording
Lee,S.H. ; Naulleau,P. ; Goldberg,K.A. ; Cho,C.H. ; Bokor,J.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.823-828,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
9.

国際会議録
国際会議録
9. Direct comparison of EUV and visible-light interferometries
Goldberg,K.A. ; Naulleau,P. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Gaughan,R.J. ; Chapman,H.N. ; Goldsmith,J.E.M. ; Bokor,J.
出版情報: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.635-642,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3676
10.

国際会議録
国際会議録
10. Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry
Goldberg,K.A. ; Tejnil,E. ; Lee,S.H. ; Medecki,H. ; Attwood,D.T. ; Jackson,K.H. ; Bokor,J.
出版情報: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.264-270,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3048