1.

国際会議録
国際会議録
1. Optimal design of antireflective layer for DUV lithography and experimental results
Lee,S.G. ; Lee,K.-I. ; Seo,C.-K. ; Lee,J.-U. ; Choi,Y. ; Nam,B. ; Yu,J.Y. ; Jeong,J.-K.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.409-418,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. More stable algorithm for rigorous coupled-wave analysis applied to topography simulation in optical lithography and its numerical implementation
Lee,S.G. ; Lee,K.-I. ; Lee,J.-U. ; Choi,Y. ; Kim,H.-S.
出版情報: Optical Microlithography IX.  Part1  pp.288-298,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2726