1.

国際会議録
国際会議録
1. Application of substructuring method to three-dimensional optical lithography simulation
Lee,S.G. ; Seo,C.-K. ; Lee,D.-H. ; Lee,J.-U. ; Cho,M.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.795-802,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
2.

国際会議録
国際会議録
2. Development of an integrated 3D lithography simulator
Seo,C.-K. ; Lee,S.G. ; Lee,J.-U.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.777-784,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
3.

国際会議録
国際会議録
3. Optimal design of antireflective layer for DUV lithography and experimental results
Lee,S.G. ; Lee,K.-I. ; Seo,C.-K. ; Lee,J.-U. ; Choi,Y. ; Nam,B. ; Yu,J.Y. ; Jeong,J.-K.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.409-418,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
4.

国際会議録
国際会議録
4. Application of an effective wavelet matrix transform approach for optical lithography simulation:analysis of topological effects of phase-shifting masks
Lee,S.G. ; Kim,H.-J. ; Lee,D.-H. ; Lee,J.-U.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.723-733,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
5.

国際会議録
国際会議録
5. More stable algorithm for rigorous coupled-wave analysis applied to topography simulation in optical lithography and its numerical implementation
Lee,S.G. ; Lee,K.-I. ; Lee,J.-U. ; Choi,Y. ; Kim,H.-S.
出版情報: Optical Microlithography IX.  Part1  pp.288-298,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2726