1.

国際会議録
国際会議録
1. ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability
Lee,G. ; Koh,C.-W. ; Hong,S.-E. ; Jung,J.-C. ; Jung,M.-H. ; Kim,H.-S. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.13-22,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
2.

国際会議録
国際会議録
2. Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists
Hong,S.-E. ; Jung,M.-H. ; Jung,J.-C. ; Lee,G. ; Kim,J.-S. ; Koh,C.-W. ; Baik,K.-H.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.966-973,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
3.

国際会議録
国際会議録
3. Two-dimensional wavelet-packet-based feature selection method for image recognition
Kim,M. ; Baek,J. ; Kim,S. ; Lee,G.
出版情報: Document recognition and retrieval VIII : 24-25 January, 2001, San Jose, [California] USA.  pp.307-314,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4307
4.

国際会議録
国際会議録
4. Regularized dequantizers for DCT-based transform coding of images
Lee,G. ; Kim,S. ; Song,S.M.-H.
出版情報: Visual communications and image processing 2001 : 24-26 January, 2001, San Jose, USA.  pp.830-837,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4310
5.

国際会議録
国際会議録
5. Are the color gamuts of CRT and LCD triangular? An experimental study
Lee,G. ; Wen,C.
出版情報: Display technologies III : 26-27 July 2000, Taipei, Taiwan.  pp.271-278,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4079
6.

国際会議録
国際会議録
6. "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"
Koh,C.-W. ; Jung,J.-C. ; Kim,M.-S. ; Kong,K.-K. ; Lee,G. ; Jung,M.-H. ; Kim,J.-S. ; Shin,K.-S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.798-803,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
7.

国際会議録
国際会議録
7. Novel routes toward sub-70-nm contact windows by using new KrF photoresist
Kim,J.-S. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Shin,K.-S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.232-240,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
8.

国際会議録
国際会議録
8. Novel high-performance ArF resist for sub-100-nm lithography
Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.150-158,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
9.

国際会議録
国際会議録
9. Band-limited interpolation for maximum-intensity projection images
Kim,S. ; Song,S.M.-H. ; Kim,N.-H. ; Lee,G. ; Kreang-arekul,S. ; Iwase,A. ; Taylor,R.
出版情報: High-Speed Imaging and Sequence Analysis III.  pp.78-85,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4308
10.

国際会議録
国際会議録
10. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.94-105,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345