1.

国際会議録
国際会議録
1. Novel surface silylation process for chemically amplified photoresist
Lee, S.-H. ; Hong, J. ; Woo, S.-G. ; Cho, H.-G. ; Han, W,-S.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.1005-1012,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
2.

国際会議録
国際会議録
2. Improvement of line edge roughness by employing new PAG
Kim, Y.-S. ; Kim, Y.-H. ; Lee, S.-H. ; Yim, Y.-G. ; Kim, D,-B. ; Kim, J.-H.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.829-836,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Dammel, R.R. ; Sakamuri, R. ; Lee, S.-H. ; Rahman, M.D. ; Kudo, T. ; Romano, A.R. ; Rhodes, L.F. ; Lipian, J. ; Hacker, C. ; Barnes, D.A.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.101-109,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
4.

国際会議録
国際会議録
4. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.127-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
5.

国際会議録
国際会議録
5. An efficient wavelet-based motion estimation algorithm
Bae, J.-W. ; Lee, S.-H. ; Yoo, J.-S.
出版情報: Applications of digital image processing XXVII : 2-6 August 2004, Denver, Colorado, USA.  pp.890-900,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5558
6.

国際会議録
国際会議録
6. Automatic movie skimming with story units via general tempo analysis
Lee, S.-H. ; Yeh, C.H. ; Kuo, C.-C.J.
出版情報: Storage and Retrieval Methods and Applications for Multimedia 2004.  pp.396-407,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5307
7.

国際会議録
国際会議録
7. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.150-159,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
8.

国際会議録
国際会議録
8. Measurement of all the elastic, piezoelectric, and dielectric properties of PMN-PT single crystals
Lee, S.-H. ; Lee, S.-S. ; Roh, Y.R. ; Lee, H.-Y. ; Han, J.-H.
出版情報: Smart structures and materials 2003 : Active materials : Behavior and mechanics : 3-6 March 2003, San Diego, California, USA.  pp.505-512,  2003.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5053
9.

国際会議録
国際会議録
9. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
出版情報: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
10.

国際会議録
国際会議録
10. Technical issues associated with the detection of buried land mines with high-frequency seismic waves
Lee, S.-H. ; Scott, W.R. Jr. ; Martin, J.S. ; Larson, G.D. ; McCall, G.S., II
出版情報: Detection and Remediation Technologies for Mines and Minelike Targets VII.  Part Two  pp.617-628,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4742