1.

国際会議録
国際会議録
1. EFFECTS OF SILICON ION IMPLANTATION UPON THIN GATE OXIDE INTEGRITY
Lee, G.-S. ; Park, J. -G. ; Choi, S. -P. ; Shin, C.-H, ; Sun, Y.-B ; Kwak, Y.-S. ; Shin, C.-K. ; Smith, W. L. ; Hahn, S.
出版情報: Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A..  pp.1043-1048,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 262
2.

国際会議録
国際会議録
2. Organosiloxane based bottom antireflective coatings for 193nm lithography
Son, E.-K. ; Kim, J.-W. ; Lee, S.-H. ; Park, C.-S. ; Lee, J.-W. ; Kim, J. ; Lee, G.-S. ; Lee, S.-K. ; Ban, K.-D. ; Jung, J.-C. ; Bok, C. K. ; Moon, S.-C.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.449-458,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
3.

国際会議録
国際会議録
3. Contact hole patterning performance of ArF resist for 0.10μm technology node
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.577-585,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690