1.

国際会議録
国際会議録
1. A Study Of Boron Clustering Transients and Mechanisms in Doped Silicon
Lilak, Aaron Douglas ; Krishnamoorthy, Viswanath ; Vieira, David ; Law, Mark E. ; Jones, K. S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B5.4-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
2.

国際会議録
国際会議録
2. The Effect Of Impurities On Diffusion And Activation Of Ion Implanted Boron In Silicon
Robertson, L.S. ; Brindos, R. ; Jones, K. S. ; Law, Mark E. ; Downey, D. F. ; Falk, S. ; Liu, J.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B5.8-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
3.

国際会議録
国際会議録
3. Effect Of Nitrogen Implants On Boron Transient Enhanced Diffusion
Dokumaci, Omer ; Ronsheim, Paul ; Hegde, Suri ; Chidambarrao, Dureseti ; Shaik-Adam, Lahir ; Law, Mark E.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B5.9-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
4.

国際会議録
国際会議録
4. A Physically Based Modeling Of Boron TED In Amorphized Si
Earles, S.K. ; Law, Mark E. ; Jones, K.S. ; Brindos, Rich ; Talwar, Somit
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B10.4-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
5.

国際会議録
国際会議録
5. Energy Dependence Of Transient Enhanced Diffusion And {311} Defect Kinetics
Saleh, Hugo ; Law, Mark E. ; Bharatan, Sushil ; Jones, K. S. ; Krishnamoorthy, Wish ; Buyuklimanli, Temel
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B6.7-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
6.

国際会議録
国際会議録
6. Influence of Carbon on the Diffusion of Interstitials and Boron in Silicon
Law, Mark E. ; Griglione, Michelle D. ; Northridge, Misty
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B7.4-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
7.

国際会議録
国際会議録
7. Phosphorus / Silicon Interstitial Annealing After Ion Implantation
Keys, P. H. ; Brindos, R. ; Krishnamoorthy, V. ; Puga-Lambers, M. ; Jones, K. S. ; Law, Mark E.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B6.6-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
8.

国際会議録
国際会議録
8. Experimental Investigation of Transient-Enhanced Diffusion (TED) of Phosphorous Implants in Silicon in the MeV Range
Adam, Lahir S. ; Law, Mark E.
出版情報: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.309-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 469
9.

国際会議録
国際会議録
9. Modeling Dislocation Loop Nucleation And Evolution In Germanium, Arsenic And Boron Implanted Silicon
Avci, Ibrahim ; Law, Mark E.
出版情報: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.249-254,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 717
10.

国際会議録
国際会議録
10. Process Modeling for Advanced Devices
Law, Mark E. ; Jones, Kevin S. ; Radic, Ljubo ; Crosby, Robert ; Clark, Mark ; Gable, Kevin ; Ross, Carrie
出版情報: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.69-76,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 810