1.

国際会議録
国際会議録
1. Small signal ac-surface photovoltage technique for noncontact monitoring of near-surface doping for IC-processing
Marinskiy,D.N. ; Lagowski,J.J. ; Wilson,M. ; Jastrzebski,L. ; Santiesteban,R. ; Elshot,K.
出版情報: Process Control and Diagnostics.  pp.72-77,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4182
2.

国際会議録
国際会議録
2. Real-time preparation-free imaging of mobile charge in SiO2
Jastrzebski,L. ; Edelman,P. ; Lagowski,J.J. ; Hoff,A.M. ; Savchouk,A. ; Persson,E.
出版情報: Optical characterization techniques for high-performance microelectronic device manufacturing III.  pp.207-217,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2877
3.

国際会議録
国際会議録
3. Contact potential difference methods for full wafer characterization of Si/Si02 interface defects induced by plasma processing (Invited Paper)
Edelman,P. ; Savchouk,A. ; Wilson,M. ; Jastrzebski,L. ; Lagowski,J.J. ; Nauka,K. ; Ma,S. ; Hoff,A.M. ; DeBusk,D.K.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.126-136,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3509