1.

国際会議録
国際会議録
1. Implementation of adaptive site optimization in model-based OPC for minimizing ripples [6156-63]
Bahnas, M. ; Al-lmam M ; Seoud, A. ; LaCour, P. ; Ragai H F
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615615-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. Impact of process variation on 65nm across-chip Iinewidth variation [6156-64]
Hong, L. ; Brist, T. ; LaCour, P. ; Sturtevant, J. ; Niehoff, M. ; Niedermaier, P.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
3.

国際会議録
国際会議録
3. Optimization of the data preparation for variable-shape beam mask writing machines
Schulze, S.F. ; LaCour, P.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.222-232,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
4.

国際会議録
国際会議録
4. New stream format: progress report on containing data size explosion
LaCour, P. ; Reich, A.J. ; Nakagawa, K.H. ; Schulze, S.F. ; Grodd, L.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.214-221,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
5.

国際会議録
国際会議録
5. Considerations for the use of defocus models for OPC
Sturtevant, J. L. ; Torres, J. A. ; Word, J. ; Granik, Y. ; LaCour, P.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.427-436,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
6.

国際会議録
国際会議録
6. Assessing the impact of real world manufacturing lithography variations on post-OPC CD control
Sturtevant, J. L. ; Word, J. ; LaCour, P. ; Park, J. W. ; Smith, D.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.240-254,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
7.

国際会議録
国際会議録
7. Model-based OPC for sub-resolution assist feature enhanced layouts
LaCour, P. ; Pell, E.A. ; Granik, Y. ; Do, T.
出版情報: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.540-546,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4692
8.

国際会議録
国際会議録
8. Statistical data assessment for optimization of data preparation and manufacturing
Schulze, S.F. ; LaCour, P.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.286-292,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
9.

国際会議録
国際会議録
9. Strong phase-shitting optical maskless lithography for the 65 nm node and beyond
V., J.Word ; Torres, A. ; LaCour, P.
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.465-475,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
10.

国際会議録
国際会議録
10. OASIS-based data preparation flows: progress report on containing data size explosion
Schulze, S.F. ; LaCour, P. ; Grodd, L.
出版情報: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.149-157,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5379