EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING
- 著者名:
Park, H.-H. Kwon, K.-H. Lee, S.-H. Nahm, S. Lee, J.-W. Koak, B.-H. Suh, K.-S. Kwon, O.-J. Lee, J.-L. Yeom, G.-Y. - 掲載資料名:
- Surface chemical cleaning and passivation for semiconductor processing
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 315
- 発行年:
- 1993
- 開始ページ:
- 243
- 出版情報:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992139 [1558992138]
- 言語:
- 英語
- 請求記号:
- M23500/315
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
3
国際会議録
Ion-enhanced dry etching of magnetic multilayers: Post-etch cleaning and effects of UV illumination
MRS-Materials Research Society |
9
国際会議録
Surface Preparation of 6H-Silicon Carbide Substrates for Growth of High-Quality SiC Epilayers
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Effects of Void Formation on Electrical and Optical Properties of 3C-SiC on Si(111)Substrates
Trans Tech Publications |
Materials Research Society |
Trans Tech Publications |
Electrochemical Society |
Electrochemical Society |